3D Simulation of Nano-Imprint Lithography
A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwards type. We have used a 3D Lagrangian Galerkin finite element methods implemented on a parallel computer architecture. In a Lagrangian techniques, the node point follows the particle movement, allowing for the movement of free surfaces or interfaces. We have extended the method to handle the dynamic movement of the contact line between the polymer melt and stamp during mold filling.
- 3D Simulation of Nano-Imprint Lithography
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- Available under Open Access This content is freely available online to anyone, anywhere at any time.
Nanoscale Research Letters
Volume 5, Issue 2 , pp 274-278
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- Finite element
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- 1. Department of Mechanical Engineering, Technical University of Denmark, 2800, Lyngby, Denmark
- 2. Department of Chemical and Biochemical Engineering, Technical University of Denmark, 2800, Lyngby, Denmark