, Volume 4, Issue 4, pp 389-390,
Open Access This content is freely available online to anyone, anywhere at any time.

A Nanopatterning Technique: DUV Interferometry of a Reactive Plasma Polymer

This is an excerpt from the content

Recently, great emphasis has been placed on the fabrication of chemical and topographical functional materials on both the micrometer and nanometer scale, due to novel phenomena that occur at this scale. Most techniques reported to date suffer from the ability to satisfy the different material requirements and makes it difficult to reproduce both topographical patterns with a wide range of well defined structures and chemical patterns with well defined geometries. Furthermore, the size of the patterns depends on the technique utilized and can often vary between the micrometer to the sub-10 nanometer length scale (Fig. 1).Fig. 1

Plasma deposited polymer and UV-irradiation through a photomask

One successful technique that has been utilized for functional surfaces is plasma polymerization. This technique allows the plasma-chemical surface functionalization step to be independent of the substrate, good adhesion of plasma polymer thin films with most substrates, surface density of immobilized