Journal of Electronic Materials

, Volume 36, Issue 4, pp 426–430

Comparison of GaN and In0.04Ga0.96N p-Layers on the Electrical and Electroluminescence Properties of Green Light Emitting Diodes

  • J. B. Limb
  • W. Lee
  • J. H. Ryou
  • D. Yoo
  • R. D. Dupuis
Special Issue Paper

DOI: 10.1007/s11664-006-0072-6

Cite this article as:
Limb, J.B., Lee, W., Ryou, J.H. et al. Journal of Elec Materi (2007) 36: 426. doi:10.1007/s11664-006-0072-6
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We have compared the effects of Mg-doped GaN and In0.04Ga0.96N layers on the electrical and electroluminescence (EL) properties of the green light emitting diodes (LEDs). To investigate the effects of different p-layers on the LED performance, the diode active region structures were kept identical. For LEDs with p-InGaN layers, the p-In0.04Ga0.96N/GaN polarization-related EL peak was dominant at low current levels, while the multiple-quantum-well (MQW) peak became dominant at higher current levels, different from LEDs with p-GaN layers. Also, LEDs with p-InGaN exhibited slightly higher turn on voltages (Von) and forward voltages (Vf) compared to LEDs with p-GaN layers. However, the MQW related EL intensity was much higher and diode series resistance lower for LEDs with p-InGaN layers compared with LEDs with p-GaN, showing possible improvements in output power for LEDs with p-InGaN layers. The diodes with p-GaN layers typically showed Vf of ∼3.1 V at a drive current of 20 mA, with a series resistance of ∼24.7 Ω, while diodes with p-InGaN showed Vf of ∼3.2 V, with a series resistance of ∼18.5 Ω, for device dimensions of 230 μm by 230 μm.

Keywords

Light emitting diode (LED)gallium nitride (GaN)metalorganic chemical vapor deposition (MOCVD)InGaN

Copyright information

© TMS 2007

Authors and Affiliations

  • J. B. Limb
    • 1
  • W. Lee
    • 1
  • J. H. Ryou
    • 1
  • D. Yoo
    • 1
    • 2
  • R. D. Dupuis
    • 1
    • 2
  1. 1.Center for Compound Semiconductors and School of Electrical and Computer EngineeringGeorgia Institute of TechnologyAtlantaUSA
  2. 2.School of Materials Science and EngineeringGeorgia Institute of TechnologyAtlantaUSA