Regular Issue Paper

Journal of Electronic Materials

, Volume 34, Issue 10, pp 1307-1309

First online:

Roughness and texture correlation of Al films

  • Wenjie ZhangAffiliated withShanghai Institute of Microsystem and Information Technology, Chinese Academy of SciencesGraduate School of Chinese Academy of Sciences
  • , Leeward YiAffiliated withShanghai Institute of Microsystem and Information Technology, Chinese Academy of SciencesGraduate School of Chinese Academy of Sciences
  • , Juineng TuAffiliated withGrace Semiconductor Manufacturing Corporation
  • , Pingyi ChangAffiliated withGrace Semiconductor Manufacturing Corporation
  • , Duli MaoAffiliated withGrace Semiconductor Manufacturing Corporation
  • , Jin WuAffiliated withGrace Semiconductor Manufacturing Corporation

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Abstract

Titanium films prepared by standard direct-current (DC) magnetron physical vapor deposition (PVD) and ionized metal plasma PVD (I-PVD), with Al (0.5wt.%Cu) films on them, were studied. The surface roughness, reflectivity, and crystalline texture of Ti on SiO2/Si and Al on TiN/Ti/SiO2/Si were investigated with the same thickness of Al, TiN, and Ti. The surface roughness of Al films with Ti/TiN underlayers was found to be capable of monitoring Al(111) texture. So, the reflectivity of Al/TiN/Ti film stack can be used as a quick monitor for the electromigration (EM) lifetime.

Key words

Roughness texture electromigration