Journal of Electronic Materials

, Volume 34, Issue 10, pp 1307–1309

Roughness and texture correlation of Al films

  • Wenjie Zhang
  • Leeward Yi
  • Juineng Tu
  • Pingyi Chang
  • Duli Mao
  • Jin Wu
Regular Issue Paper

DOI: 10.1007/s11664-005-0254-7

Cite this article as:
Zhang, W., Yi, L., Tu, J. et al. Journal of Elec Materi (2005) 34: 1307. doi:10.1007/s11664-005-0254-7

Abstract

Titanium films prepared by standard direct-current (DC) magnetron physical vapor deposition (PVD) and ionized metal plasma PVD (I-PVD), with Al (0.5wt.%Cu) films on them, were studied. The surface roughness, reflectivity, and crystalline texture of Ti on SiO2/Si and Al on TiN/Ti/SiO2/Si were investigated with the same thickness of Al, TiN, and Ti. The surface roughness of Al films with Ti/TiN underlayers was found to be capable of monitoring Al(111) texture. So, the reflectivity of Al/TiN/Ti film stack can be used as a quick monitor for the electromigration (EM) lifetime.

Key words

Roughnesstextureelectromigration

Copyright information

© TMS-The Minerals, Metals and Materials Society 2005

Authors and Affiliations

  • Wenjie Zhang
    • 1
    • 2
  • Leeward Yi
    • 1
    • 2
  • Juineng Tu
    • 3
  • Pingyi Chang
    • 3
  • Duli Mao
    • 3
  • Jin Wu
    • 3
  1. 1.Shanghai Institute of Microsystem and Information TechnologyChinese Academy of SciencesShanghaiChina
  2. 2.Graduate School of Chinese Academy of SciencesBeijingChina
  3. 3.Grace Semiconductor Manufacturing CorporationShanghaiChina