Reprocessing of thermally oxidized aluminum arsenide (AlAs) in epitaxial multilayers without delamination
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- Hobbs, L., Eddie, I., Erwin, G. et al. Journal of Elec Materi (2005) 34: 232. doi:10.1007/s11664-005-0209-z
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Annealing or processing of AlAs that has been subjected to a wet thermal oxidation process can result in severe delamination of material at the oxidation front. This paper reports a procedure for preventing this delamination and presents a possible cause for the delamination.