, Volume 19, Issue 10, pp 1359–1365

Tailoring of electrochemical properties of V2O5 thin films grown on flexible substrates using plasma-assisted activated reactive evaporation

Original Paper

DOI: 10.1007/s11581-013-0862-9

Cite this article as:
Krishna, K.H. & Hussain, O.M. Ionics (2013) 19: 1359. doi:10.1007/s11581-013-0862-9


The vanadium pentoxide (V2O5) thin films have been deposited using home built activated reactive evaporation technique on indium tin oxide-coated flexible Kapton substrates and investigated their microstructural and electrochemical properties. X-ray diffraction pattern displayed predominant (001) orientation designating the orthorhombic structure of the films deposited at optimised growth conditions. The surface of the films is observed to be composed of vertical elliptical-shaped grains of size 98 nm distributed uniformly over the surface of the films provided with root mean square surface roughness of 9 nm as evidenced from atomic force microscopy studies. As-deposited V2O5 thin films demonstrated constant discharge capacity of about 60 μAh/(cm2μm) for 10 cycles at room temperature in the potential window of 4.0–2.5 V. The influence of silver (Ag) interlayer on electrochemical properties of V2O5 films was investigated and observed appreciable improvement in electrochemical performance of ‘V2O5/Ag/V2O5’ films. The multilayered V2O5/Ag/V2O5 films exhibited a discharge capacity of about 75 μAh/(cm2μm) provided with enhanced cycliability.


Activated reactive evaporationFlexible substratesV2O5 thin filmsV2O5/Ag/V2O5 filmsMicrostructural and electrochemical properties

Copyright information

© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  1. 1.Dipartimento di FisicaUniversità della CalabriaRendeItaly
  2. 2.Thin Films Laboratory, Department of PhysicsSri Venkateswara UniversityTirupatiIndia