Plasmonics

, Volume 7, Issue 4, pp 695–699

A CMOS Image Sensor Integrated with Plasmonic Colour Filters

Authors

  • Q. Chen
    • School of EngineeringUniversity of Glasgow
  • D. Das
    • Department of Engineering ScienceUniversity of Oxford
  • D. Chitnis
    • Department of Engineering ScienceUniversity of Oxford
  • K. Walls
    • School of EngineeringUniversity of Glasgow
  • T. D. Drysdale
    • School of EngineeringUniversity of Glasgow
  • S. Collins
    • Department of Engineering ScienceUniversity of Oxford
    • School of EngineeringUniversity of Glasgow
Article

DOI: 10.1007/s11468-012-9360-6

Cite this article as:
Chen, Q., Das, D., Chitnis, D. et al. Plasmonics (2012) 7: 695. doi:10.1007/s11468-012-9360-6

Abstract

Multi-pixel, 4.5 × 9 μm, plasmonic colour filters, consisting of periodic subwavelength holes in an aluminium film, were directly integrated on the top surface of a complementary metal oxide semiconductor (CMOS) image sensor (CIS) using electron beam lithography and dry etch. The 100 × 100-pixel plasmonic CIS showed full colour sensitivities across the visible range determined by a photocurrent measurement. The filters were fabricated in a simple process utilising a single lithography step. This is to be compared with the traditional multi-step processing when using dye-doped polymers. The intrinsic compatibility of these plasmonic components with a standard CMOS process allows them to be manufactured in a metal layer close to the photodiodes. The incorporation of such plasmonic components may in the future enable the development of advanced CIS with low cost, low cross-talk and increased functionality.

Keywords

CMOS image sensorsColour filtersSurface plasmonsSubwavelength structures

Copyright information

© Springer Science+Business Media, LLC 2012