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Model of the coating growth under the conditions of magnetron sputtering deposition

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Russian Physics Journal Aims and scope

A mathematical model of a coating that grows during magnetron deposition is formulated and examined. The effect of the main technological and kinetic parameters on the coating growth dynamics is investigated.

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Authors and Affiliations

  1. Institute of Strength Physics and Materials Science of the Siberian Branch of the Russian Academy of Sciences, Tomsk, Russia

    A. G. Knyazeva

  2. Tomsk State University, Tomsk, Russia

    S. A. Shanin

Authors
  1. A. G. Knyazeva
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  2. S. A. Shanin
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Corresponding author

Correspondence to S. A. Shanin.

Additional information

Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 76–81, January, 2010.

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Knyazeva, A.G., Shanin, S.A. Model of the coating growth under the conditions of magnetron sputtering deposition. Russ Phys J 53, 83–89 (2010). https://doi.org/10.1007/s11182-010-9391-4

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  • DOI: https://doi.org/10.1007/s11182-010-9391-4

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