Quantum Information Processing

, Volume 11, Issue 4, pp 891–901

Quantum lithography: status of the field

Authors

    • Institute of Optics and Department of Physics and AstronomyUniversity of Rochester
    • Department of Physics and School of Information Technology and EngineeringUniversity of Ottawa
  • Jonathan P. Dowling
    • Department of Physics and Astronomy, Hearne Institute for Theoretical PhysicsLouisiana State University
Article

DOI: 10.1007/s11128-011-0253-y

Cite this article as:
Boyd, R.W. & Dowling, J.P. Quantum Inf Process (2012) 11: 891. doi:10.1007/s11128-011-0253-y

Abstract

This contribution provides an analysis of progress in the field of quantum lithography. We review the conceptual foundations of this idea and the status of research aimed at implementing this idea in the laboratory. The selection of a highly sensitive recording material that functions by means of multiphoton absorption seems crucial to the success of the proposal of quantum lithography. This review thus devotes considerable attention to these materials considerations.

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Copyright information

© Springer Science+Business Media, LLC 2011