Plasma Chemistry and Plasma Processing

, Volume 32, Issue 6, pp 1169–1188

Ethylene Epoxidation in Cylindrical Dielectric Barrier Discharge: Effects of Separate Ethylene/Oxygen Feed

Authors

  • Thitiporn Suttikul
    • The Petroleum and Petrochemical CollegeChulalongkorn University
  • Chakrit Tongurai
    • Department of Chemical EngineeringPrince of Songkla University
  • Hidetoshi Sekiguchi
    • Department of Chemical EngineeringTokyo Institute of Technology
    • The Petroleum and Petrochemical CollegeChulalongkorn University
    • Center of Excellence on Petrochemical and Materials TechnologyChulalongkorn University
Original Paper

DOI: 10.1007/s11090-012-9398-4

Cite this article as:
Suttikul, T., Tongurai, C., Sekiguchi, H. et al. Plasma Chem Plasma Process (2012) 32: 1169. doi:10.1007/s11090-012-9398-4

Abstract

The effects of separate C2H4/O2 feed and C2H4 feed position on the ethylene epoxidation reaction in an AC cylindrical dielectric barrier discharge reactor were investigated. The highest EO selectivity of 34 % and EO yield of 7.5 %, as well as the lowest power consumption of 1.72 × 10−16 Ws/molecule of EO produced, were obtained at a C2H4 feed position of 0.25, an O2/C2H4 feed molar ratio of 1/4, an applied voltage of 13 kV, an input frequency of 550 Hz, and a total feed flow rate of 75 cm3/min. The results demonstrated, for the first time, that the separate feed of C2H4 and O2 could provide better ethylene epoxidation performance in terms of higher EO selectivity and yield, and lower power consumption, as compared to the mixed feed. All undesired reactions including C2H4 cracking, dehydrogenation, oxidation, and coupling reactions are lowered by the ethylene separate feed because of a decrease in opportunity of ethylene molecules to be activated by generated electrons.

Keywords

EpoxidationEthylene oxideDielectric barrier dischargeFeed position

Copyright information

© Springer Science+Business Media, LLC 2012