Journal of Materials Science

, Volume 44, Issue 13, pp 3408–3412

Microstructure and mechanical properties of nanolayered W/W–C thin films

Article

DOI: 10.1007/s10853-009-3452-5

Cite this article as:
Abdelouahdi, K., Legrand-Buscema, C. & Aubert, P. J Mater Sci (2009) 44: 3408. doi:10.1007/s10853-009-3452-5

Abstract

The present study reports on the mechanical and structural properties of W/W–C multilayered thin films with bilayer periods Λ ranging from 2.5 to 100 nm. Films were grown by reactive sputtering radio frequency on Si (100) substrate. X-ray diffraction (XRD), grazing incidence X-ray diffraction (GIXRD) and X-ray reflectivity were used to globally characterise the multilayers structure. Hardness and Young modulus have been determined using nanoindentation with a Berkovich tip. The XRD and the GIXRD diagrams revealed the presence of three phases: WC1−x randomly oriented, W2C with (100) preferred orientation and W with (110) preferred orientation. An increase in hardness is observed with decreasing period Λ, reaching a maximum value of ~26 GPa at Λ = 2.5 nm.

Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  1. 1.Laboratoire d’étude des Milieux NanométriquesUniversité d’Evry Val d’EssonneEvry CedexFrance