Journal of Computer-Aided Materials Design

, Volume 12, Issue 1, pp 35–56

A Self-regulation Mechanism of the Resist Development Process in Integrated Circuit Fabrication and its Phase-space Picture

Article

DOI: 10.1007/s10820-005-0834-0

Cite this article as:
Sirakoulis, G.C. & Karafyllidis, I. J Computer-Aided Mater Des (2005) 12: 35. doi:10.1007/s10820-005-0834-0

Abstract

Lithography is the most important process in integrated circuit fabrication. Lithographic profile defect simulator based on cellular automata revealed a self-regulation mechanism of the resist development process, which is expressed as a tendency of the etch-front to retain its parabolic shape. The phase-space picture of this mechanism is an attractor and it is certified that the resit-etchant system spends much time near the unperturbed state.

Keywords:

attractor cellular automata lithography self-regulation 

Copyright information

© Springer 2005

Authors and Affiliations

  • Georgios Ch. Sirakoulis
    • 1
  • Ioannis Karafyllidis
    • 1
  1. 1.Department of Electrical and Computer EngineeringDemocritus University of ThraceXanthiGreece