Optical Review

, Volume 16, Issue 4, pp 505–510

Optical and mechanical properties of AlF3 films produced by pulse magnetron sputtering of Al targets with CF4/O2 gas

  • Bo-Huei Liao
  • Cheng-Chung Lee
  • Cheng-Chung Jaing
  • Ming-Chung Liu
Regular Papers

DOI: 10.1007/s10043-009-0099-z

Cite this article as:
Liao, BH., Lee, CC., Jaing, CC. et al. OPT REV (2009) 16: 505. doi:10.1007/s10043-009-0099-z

Abstract

In this study, AlF3 thin films were deposited by pulse magnetron sputtering of Al targets with different ratios of CF4/O2 gas and at different sputtering powers. The optical and mechanical properties of the AlF3 thin films were analyzed. The transmittance spectra showed no obvious negative inhomogeneous refractive indices. Denser films with a low optical absorption were obtained when high sputtering powers were used (larger than 30 W). The lowest extinction coefficient (7.3 × 10−4 at 193 nm) of the films can be reached with 12 sccm O2 flow rate and at 160W sputtering power. All of the residual stresses were compressive and their trends were consistent with the refractive indices. The lowest compressive stress (0.068 GPa) was obtained when the AlF3 films were prepared at 160W sputtering power.

Keywords

aluminium fluoridepulse magnetron sputteringoptical propertytransmittance spectrumsputtering power

Copyright information

© The Optical Society of Japan 2009

Authors and Affiliations

  • Bo-Huei Liao
    • 1
  • Cheng-Chung Lee
    • 1
  • Cheng-Chung Jaing
    • 2
  • Ming-Chung Liu
    • 1
  1. 1.Thin Film Technology Center/Department of Optics and PhotonicsNational Central UniversityChungliTaiwan
  2. 2.Department of Electronic Engineering, Optoelectronics Technology Research CenterMinghsin University of Science and TechnologyHsinchuTaiwan