Optical Review

, Volume 16, Issue 3, pp 343–346

Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

  • Chien-Chang Chao
  • Chih-Ming Wang
  • Yia-Chung Chang
  • Jenq-Yang Chang
Regular Papers

DOI: 10.1007/s10043-009-0064-x

Cite this article as:
Chao, CC., Wang, CM., Chang, YC. et al. OPT REV (2009) 16: 343. doi:10.1007/s10043-009-0064-x

Abstract

A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.

Keywords

plasmonic multilayer amorphous silicon photovoltaic surface plasmons 

Copyright information

© The Optical Society of Japan 2009

Authors and Affiliations

  • Chien-Chang Chao
    • 1
  • Chih-Ming Wang
    • 2
  • Yia-Chung Chang
    • 3
  • Jenq-Yang Chang
    • 1
  1. 1.Department of Optics and PhotonicsNational Central UniversityJhongliTaiwan, R.O.C.
  2. 2.Institute of Opto-electronic EngineeringNational Dong Hwa UniversityHualienTaiwan, R.O.C.
  3. 3.Research Center for Applied SciencesAcademia SinicaTaipeiTaiwan, R.O.C.

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