Orthogonal Aberration Functions for Microlithographic Optics
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- Matsuyama, T. & Ujike, T. OPT REV (2004) 11: 199. doi:10.1007/s10043-004-0199-8
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Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.