, Volume 11, Issue 4, pp 199-207

Orthogonal Aberration Functions for Microlithographic Optics

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Abstract

Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.