Optical Review

, Volume 11, Issue 4, pp 199–207

Orthogonal Aberration Functions for Microlithographic Optics

  • Tomoyuki Matsuyama
  • Tomoko Ujike
Article

DOI: 10.1007/s10043-004-0199-8

Cite this article as:
Matsuyama, T. & Ujike, T. OPT REV (2004) 11: 199. doi:10.1007/s10043-004-0199-8

Abstract

Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.

Key words

aberration functionsZernike polynomialsorthogonalizationmicrolithographic lenswavefront aberration

Copyright information

© The Optical Society of Japan 2004

Authors and Affiliations

  • Tomoyuki Matsuyama
    • 1
  • Tomoko Ujike
    • 2
  1. 1.Optical Development DepartmentPrecision Equipment Company, Nikon CorporationKumagayaJapan
  2. 2.Imaging Technology Development DepartmentCore Technology Center, Nikon CorporationKumagayaJapan