Journal of Solid State Electrochemistry

, Volume 9, Issue 7, pp 504–511

The influence of aniline and its derivatives on the corrosion behaviour of copper in acid solution

  • J. H. Henriquez-Román
  • M. Sancy
  • M. A. Páez
  • L. Padilla-Campos
  • J. H. Zagal
  • C. M. Rangel
  • G. E. Thompson
Original Paper

DOI: 10.1007/s10008-004-0586-x

Cite this article as:
Henriquez-Román, J.H., Sancy, M., Páez, M.A. et al. J Solid State Electrochem (2005) 9: 504. doi:10.1007/s10008-004-0586-x

Abstract

The inhibiting action of aniline and its derivatives on the corrosion of copper in hydrochloric acid has been investigated, with emphasis on the role of substituents. With this purpose five different anilines were selected: aniline, p-chloro aniline, p-nitro aniline, p-methoxy and p-methyl aniline. The electrochemical and gravimetric results, obtained in the absence and presence of different concentrations of inhibitors, revealed that aniline reduces the corrosion of copper, with a critical concentration of 10−2 M. Furthermore, the interaction energy calculated as ΔGads gave a value of 4.2 kcal mol−1 indicating physisorption of the organic compound at the copper surface. The results have also shown that substituents, either electron donors (–CH3, –OCH3) or, electron acceptors (–NO2, –Cl) in para position, decrease the inhibition action of aniline. A theoretical study using molecular mechanic and ab initio Hartree Fock methods, to model the adsorption of aniline on copper (100) showed results in good agreement with the experimental data. Aniline adsorbs parallel to the copper surface, showing no preference for a specific adsorption site. On the other hand, from ab initio Hartree Fock calculations, an adsorption energy between 2 kcal/mol and 5 kcal/mol is obtained, which is close to the experimental value, confirming that the adsorption of aniline on the metal substrate is rather weak. In view of these results, the orientation of the aniline molecule with respect to the copper surface is considered to be the dominant effect.

Keywords

CopperCorrosion inhibitorsModelling

Copyright information

© Springer-Verlag 2005

Authors and Affiliations

  • J. H. Henriquez-Román
    • 1
  • M. Sancy
    • 1
  • M. A. Páez
    • 1
  • L. Padilla-Campos
    • 2
  • J. H. Zagal
    • 1
  • C. M. Rangel
    • 3
  • G. E. Thompson
    • 4
  1. 1.Departamento de Química de los Materiales, Facultad de Química y BiologíaUniversidad de Santiago de ChileSantiagoChile
  2. 2.Departamento de Química, Facultad de Ciencias BásicasUniversidad de AntofagastaAntofagastaChile
  3. 3.INETI, Electrochemistry of Materials UnitDMTPLisboaPortugal
  4. 4.Corrosion and Protection CentreSchool of Materials, University of ManchesterManchesterUK