Microsystem Technologies

, Volume 19, Issue 12, pp 1873–1888

Controlling parameters of focused ion beam (FIB) on high aspect ratio micro holes milling

  • Fatin Syazana Jamaludin
  • Mohd Faizul Mohd Sabri
  • Suhana Mohd Said
Review Paper

DOI: 10.1007/s00542-013-1912-y

Cite this article as:
Jamaludin, F.S., Mohd Sabri, M.F. & Said, S.M. Microsyst Technol (2013) 19: 1873. doi:10.1007/s00542-013-1912-y

Abstract

Focused ion beam (FIB) direct milling is now recognized as a new method of fabrication, due to high flexibility in milling dimensions, the possible geometries and the material selectivity. This paper discusses the fabrication of micro holes using FIB direct milling in terms of high aspect ratio structures, including FIB parameters and the major effects of FIB milling. It is deduced that sputter yield of material gives a major impact to the depth of milling. Optimization parameters coupled control of FIB direct milling will provide a precise means of fabricating of high aspect ratio micro holes whilst resolving the problem of re-deposition and amorphisation which is common in micro milling.

Copyright information

© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  • Fatin Syazana Jamaludin
    • 1
  • Mohd Faizul Mohd Sabri
    • 1
  • Suhana Mohd Said
    • 2
  1. 1.Department of Mechanical Engineering, Faculty of EngineeringUniversity of MalayaKuala LumpurMalaysia
  2. 2.Department of Electrical Engineering, Faculty of EngineeringUniversity of MalayaKuala LumpurMalaysia