Microsystem Technologies

, Volume 16, Issue 8, pp 1309–1313

Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer

  • Daiji Noda
  • Hiroshi Tsujii
  • Naoki Takahashi
  • Tadashi Hattori
Technical Paper

DOI: 10.1007/s00542-010-1085-x

Cite this article as:
Noda, D., Tsujii, H., Takahashi, N. et al. Microsyst Technol (2010) 16: 1309. doi:10.1007/s00542-010-1085-x

Abstract

X-ray imaging is used in many applications such as medical diagnosis and non-destructive inspection, and has become an essential technologies in these areas. In one image technique, X-ray phase information is obtained using X-ray Talbot interferometer, for which X-ray diffraction gratings are required; however, the manufacture of fine, highly accurate, and high aspect ratio gratings is very difficult. X-ray lithography could be used to fabricate structures with high precision since it uses highly directive syncrotron radiation. Therefore, we decided to fabricate X-ray gratings using X-ray lithography technique. The accuracy of the fabricated structure depends largely on the accuracy of the X-ray mask used. In our research, we combined deep silicon dry etching technology with ultraviolet lithography in order to fabricate untapered and high precision X-ray masks containing rectangular patterns. We succeeded in fabricating an X-ray mask with a pitch of 5.3 μm. The thickness of the Au absorber was about 5 μm, and the effective area was 60  × 60 mm2, which is a sufficient size for phase tomography imaging. We demonstrated the utility of the Si dry etching process for making high precision X-ray masks.

Copyright information

© Springer-Verlag 2010

Authors and Affiliations

  • Daiji Noda
    • 1
  • Hiroshi Tsujii
    • 1
  • Naoki Takahashi
    • 1
  • Tadashi Hattori
    • 1
  1. 1.Laboratory of Advanced Science and Technology for IndustryUniversity of HyogoAko-gunJapan

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