Microsystem Technologies

, Volume 16, Issue 8, pp 1315–1321

Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

Authors

  • Longhua Liu
    • National Synchrotron Radiation LaboratoryUniversity of Science and Technology of China
    • National Synchrotron Radiation LaboratoryUniversity of Science and Technology of China
  • Ying Xiong
    • National Synchrotron Radiation LaboratoryUniversity of Science and Technology of China
  • Jie Chen
    • National Synchrotron Radiation LaboratoryUniversity of Science and Technology of China
  • Wenjie Li
    • National Synchrotron Radiation LaboratoryUniversity of Science and Technology of China
  • Yangchao Tian
    • National Synchrotron Radiation LaboratoryUniversity of Science and Technology of China
Technical Paper

DOI: 10.1007/s00542-009-0972-5

Cite this article as:
Liu, L., Liu, G., Xiong, Y. et al. Microsyst Technol (2010) 16: 1315. doi:10.1007/s00542-009-0972-5

Abstract

X-ray imaging and microscopy techniques have been developed in worldwide due to their capabilities of large penetration power and high spatial resolution. Fresnel zone plates is considered to be one of the most convenient optic devices for X-ray imaging and microscopy system. The zone plates with aspect ratio of 7 and 13 have been fabricated by e-beam lithography combined with X-ray lithography in this paper. Firstly, the X-ray lithography mask of zone plates with outermost zone width of 100 nm was fabricated by e-beam lithography and gold electroplating techniques. Secondly, the zone plates with gold profile thickness of 700 and 1,300 nm were replicated by X-ray lithography and gold electroplating techniques. X-ray imaging and microscopy techniques were introduced to characterize the high-aspect-ratio zone plates’ inner structures. At the X-ray energy of 7.5 keV, the first-order focusing efficiency of zone plates with gold profile thickness of 700 nm is about 8.63%.

Copyright information

© Springer-Verlag 2009