Microsystem Technologies

, Volume 14, Issue 9, pp 1311–1315

Fabrication of large area diffraction grating using LIGA process

  • Daiji Noda
  • Makoto Tanaka
  • Kazuma Shimada
  • Wataru Yashiro
  • Atsushi Momose
  • Tadashi Hattori
Technical Paper

DOI: 10.1007/s00542-008-0584-5

Cite this article as:
Noda, D., Tanaka, M., Shimada, K. et al. Microsyst Technol (2008) 14: 1311. doi:10.1007/s00542-008-0584-5

Abstract

X-ray imaging is a very important technology in the fields of medical, biological, inspection, material science, etc. However, it is not enough to get the clear X-ray imaging with low absorbance. We have produced a diffraction gratings for obtaining high resolution X-ray phase imaging, such as X-ray Talbot interferometer. In this X-ray Talbot interferometer, diffraction gratings were required to have a fine, high accuracy, high aspect ratio structure. Then, we succeeded to fabricate a high aspect ratio diffraction grating with a pitch of 8 μm and small area using a deep X-ray lithography technique. We discuss that the diffraction gratings having a narrow pitch and an large effective area to obtain imaging size of practical use in medical application. If the pitch of diffraction gratings were narrow, it is expected high resolution imaging for X-ray Talbot interferometer. We succeeded and fabricated the diffraction grating with pitch of 5.3 μm, Au height of 28 μm and an effective area of 60 × 60 mm2.

Copyright information

© Springer-Verlag 2008

Authors and Affiliations

  • Daiji Noda
    • 1
  • Makoto Tanaka
    • 1
  • Kazuma Shimada
    • 1
  • Wataru Yashiro
    • 2
  • Atsushi Momose
    • 2
  • Tadashi Hattori
    • 1
  1. 1.Laboratory of Advanced Science and Technology for IndustryUniversity of HyogoAko-gunJapan
  2. 2.Graduate School of Frontier SciencesThe University of TokyoKashiwaJapan