Technical Paper

Microsystem Technologies

, Volume 13, Issue 8, pp 1411-1416

First online:

Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

  • Yoshiaki KanamoriAffiliated withDepartment of Nanomechanics, Tohoku University Email author 
  • , Junya SatoAffiliated withDepartment of Nanomechanics, Tohoku University
  • , Takeshi ShimanoAffiliated withCentral Research Laboratory, Hitachi Ltd.
  • , Shigeo NakamuraAffiliated withMechanical Engineering Research Laboratory, Hitachi Ltd.
  • , Kazuhiro HaneAffiliated withDepartment of Nanomechanics, Tohoku University

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Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.