Microsystem Technologies

, Volume 13, Issue 8, pp 1411–1416

Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

  • Yoshiaki Kanamori
  • Junya Sato
  • Takeshi Shimano
  • Shigeo Nakamura
  • Kazuhiro Hane
Technical Paper

DOI: 10.1007/s00542-007-0380-7

Cite this article as:
Kanamori, Y., Sato, J., Shimano, T. et al. Microsyst Technol (2007) 13: 1411. doi:10.1007/s00542-007-0380-7

Abstract

Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.

Copyright information

© Springer-Verlag 2007

Authors and Affiliations

  • Yoshiaki Kanamori
    • 1
  • Junya Sato
    • 1
  • Takeshi Shimano
    • 2
  • Shigeo Nakamura
    • 3
  • Kazuhiro Hane
    • 1
  1. 1.Department of NanomechanicsTohoku UniversitySendaiJapan
  2. 2.Central Research LaboratoryHitachi Ltd.YokohamaJapan
  3. 3.Mechanical Engineering Research LaboratoryHitachi Ltd.HitachinakaJapan

Personalised recommendations