Microsystem Technologies

, Volume 13, Issue 8, pp 1353–1358

Deposition of Si-DLC film and its microstructural, tribological and corrosion properties

Authors

    • National Institute of Advanced Industrial Science and Technology (AIST)
  • Masahiro Kawaguchi
    • Tokyo Metropolitan Industrial Technology Research Institute (TIRI)
  • Takahisa Kato
    • The University of Tokyo
  • Masami Ikeyama
    • National Institute of Advanced Industrial Science and Technology (AIST)
Technical Paper

DOI: 10.1007/s00542-006-0368-8

Cite this article as:
Choi, J., Kawaguchi, M., Kato, T. et al. Microsyst Technol (2007) 13: 1353. doi:10.1007/s00542-006-0368-8

Abstract

Silicon-incorporated diamond-like carbon (Si-DLC) films were deposited using a bipolar-type plasma based ion implantation and deposition technique, and the effects of Si-incorporation on the microstructural, tribological, anti-corrosion and lubricant bonding properties of the Si-DLC films were investigated. The analysis of Raman spectroscopy exhibited that the sp3 bonds in the DLC film increase due to Si addition. XPS analysis revealed that a thick oxide layer exists on the Si-DLC film surfaces. These explain the high lubricant bonding properties of the Si-DLC films compared to that of the Si-free DLC films. The silicon oxide layer on the Si-DLC film and the transferred silicon oxide layer on the steel ball prevents from the metal/DLC contact between the Si-DLC film and steel ball when sliding, which results in a low friction. Incorporation of Si in DLC films led to significant improvements in the corrosion resistance due to low internal stress and thick insulating oxide layer.

Copyright information

© Springer-Verlag 2007