Microsystem Technologies

, Volume 13, Issue 5, pp 543–546

Fabrication of diffraction grating for X-ray Talbot interferometer

  • Masatake Matsumoto
  • Kinji Takiguchi
  • Makoto Tanaka
  • Yoichi Hunabiki
  • Hiroaki Takeda
  • Atsushi Momose
  • Yuichi Utsumi
  • Tadashi Hattori
Technical Paper

DOI: 10.1007/s00542-006-0226-8

Cite this article as:
Matsumoto, M., Takiguchi, K., Tanaka, M. et al. Microsyst Technol (2007) 13: 543. doi:10.1007/s00542-006-0226-8

Abstract

Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8.

Copyright information

© Springer-Verlag 2006

Authors and Affiliations

  • Masatake Matsumoto
    • 1
  • Kinji Takiguchi
    • 2
  • Makoto Tanaka
    • 2
  • Yoichi Hunabiki
    • 3
  • Hiroaki Takeda
    • 4
  • Atsushi Momose
    • 5
  • Yuichi Utsumi
    • 6
  • Tadashi Hattori
    • 6
  1. 1.Nagase Chemtex Co. LtdHyogoJapan
  2. 2.Laboratory of Advanced Science and Technology for IndustryHimeji Institute of TechnologyHimejiJapan
  3. 3.Nano Create Co. LtdHyogoJapan
  4. 4.IKEX Industry Co. LtdAichiJapan
  5. 5.The University of TokyoTokyoJapan
  6. 6.University of HyogoHyogoJapan

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