Fabrication of diffraction grating for X-ray Talbot interferometer
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- Matsumoto, M., Takiguchi, K., Tanaka, M. et al. Microsyst Technol (2007) 13: 543. doi:10.1007/s00542-006-0226-8
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Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8.