Microsystem Technologies

, Volume 11, Issue 4, pp 292–297

LIGA fabrication of X-ray Nickel lenses

  • V. Nazmov
  • E. Reznikova
  • A. Snigirev
  • I. Snigireva
  • M. DiMichiel
  • M. Grigoriev
  • J. Mohr
  • B. Matthis
  • V. Saile
Article

DOI: 10.1007/s00542-004-0435-y

Cite this article as:
Nazmov, V., Reznikova, E., Snigirev, A. et al. Microsyst Technol (2005) 11: 292. doi:10.1007/s00542-004-0435-y

Abstract

Nickel refractive planar lenses generating line and point X-ray spots were fabricated by LIGA technology. The optimum parameters of the lenses were simulated for a kinoform lens profile and an X-ray energy range from 100 keV to 1 MeV. The focusing elements of the lens are characterised by an aspect ratio of about 200 and a side-wall roughness of less than 5 nm r.m.s. The optical characteristics of the lenses were tested at the ESRF using a photon energy of 212 keV. A focal spot of 10 μm size was measured using a X-ray sensitive film as a width at a half maximum of the darkening of this detector. A ratio of appr. 7 of the detector responses of the focused spot to the unfocused radiation was measured. The correspondent characteristics of the focal spot of the lens for the revealed photon flux are FWHM = 6 μm and ~20 for the gain.

Copyright information

© Springer-Verlag Berlin Heidelberg 2005

Authors and Affiliations

  • V. Nazmov
    • 1
  • E. Reznikova
    • 1
  • A. Snigirev
    • 2
  • I. Snigireva
    • 2
  • M. DiMichiel
    • 2
  • M. Grigoriev
    • 3
  • J. Mohr
    • 1
  • B. Matthis
    • 1
  • V. Saile
    • 1
  1. 1.Institut für MikrostrukturtechnikForschungszentrum KarlsruheKarlsruheGermany
  2. 2.European Synchrotron Radiation FacilitiesCedexFrance
  3. 3.Institute of Microelectronics TechnologyChernogolovkaRussia