Microsystem Technologies

, Volume 8, Issue 1, pp 7–9

High aspect ratio microstructures based on anisotropic porous materials

  • F. Müller
  • A. Birner
  • J. Schilling
  • A.-P. Li
  • K. Nielsch
  • U. Gösele
  • V. Lehmann

DOI: 10.1007/s00542-002-0047-3

Cite this article as:
Müller, F., Birner, A., Schilling, J. et al. Microsystem Technologies (2002) 8: 7. doi:10.1007/s00542-002-0047-3

Abstract

 Structures with high aspect ratios have been prepared by exploiting the high built-in anisotropy of some porous materials. For the structuring of these materials with nearly arbitrary shapes only standard lithography and isotropic etching is needed. We demonstrate the power of this technique for macroporous silicon and porous anodic alumina. Structures with sub-micrometer precision and aspect ratios above 100 are shown.

Copyright information

© Springer-Verlag Berlin Heidelberg 2002

Authors and Affiliations

  • F. Müller
    • 1
  • A. Birner
    • 1
  • J. Schilling
    • 1
  • A.-P. Li
    • 1
  • K. Nielsch
    • 1
  • U. Gösele
    • 1
  • V. Lehmann
    • 2
  1. 1.Max-Planck-Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany E-mail: fmuel@mpi-halle.mpg.deDE
  2. 2.Infinion Technologies AG, Corporate Technology, Otto-Hahn-Ring 6, D-81730 München, GermanyDE