Colloid and Polymer Science

, Volume 275, Issue 5, pp 419–425

Influence of water on the dielectric behaviour of chitosan films

Authors

  • A. Nogales
    • Instituto de Estructura de la MateriaC.S.I.C.
  • T. A. Ezquerra
    • Instituto de Estructura de la MateriaC.S.I.C.
  • D. R. Rueda
    • Instituto de Estructura de la MateriaC.S.I.C.
  • F. Martinez
    • Departamento de Quimica Facultad de Ciencias Fisicas y MatemáticasUniversidad de Chile
  • J. Retuert
    • Departamento de Quimica Facultad de Ciencias Fisicas y MatemáticasUniversidad de Chile
Original Contribution

DOI: 10.1007/s003960050099

Cite this article as:
Nogales, A., Ezquerra, T.A., Rueda, D.R. et al. Colloid Polym Sci (1997) 275: 419. doi:10.1007/s003960050099

Abstract

The dielectric properties of chitosan films with a degree of deacetylation of 86% have been investigated in the frequency range of 103–106 Hz covering a broad range of temperatures from — 150 to 150°C. The variation of the dielectric properties with temperature has been associated with two dielectric processes: (a) a local relaxation attributed to the presence of hydrogen-bonded water appearing at low temperatures (b) a conduction process related to water molecules which becomes desorbed upon heating at T >80 °C. Isothermal dielectric experiments have been performed in order to follow, in real time, the occurrence of both, the water sorption and desorption processes.

Key words

Dielectric relaxationwater sorptionnatural polymerschitosan

Copyright information

© Steinkopff Verlag 1997