, Volume 49, Issue 4, pp 961-968

Absolute diode laser-based in situ detection of HCl in gasification processes

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The release of HCl is an important parameter for industrial combustion and gasification processes, which must be determined in the ppm range for active process control and optimization. Based on a low power vertical-cavity surface-emitting laser (VCSEL) at 1.74 μm, we developed a new tuneable diode laser absorption spectrometer for calibration-free, absolute in situ HCl detection using the H35Cl (2 ← 0) R(3) absorption line with minimized cross-sensitivity to CO2 and H2O. The spectrometer was applied to in situ measurements in a gasification process (T = 1,130°C, P = 1 atm, L = 28 cm) and yielded an optical resolution of 2.3·10−4, i.e. a HCl sensitivity of 45 ppm (13 ppm·m).