Gas monitoring in the process industry using diode laser spectroscopy
- Cite this article as:
- Linnerud, I., Kaspersen, P. & Jaeger, T. Appl Phys B (1998) 67: 297. doi:10.1007/s003400050509
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, CO, NH3, HCl and HF are described together with measurements from several installations. The monitors show continuous measurements with fast response and good sensitivity, all of which is difficult to obtain with conventional techniques such as wet chemical analysis.