Applied Physics B

, Volume 67, Issue 3, pp 297–305

Gas monitoring in the process industry using diode laser spectroscopy

  • I. Linnerud
  • P. Kaspersen
  • T. Jaeger
Regular paper

DOI: 10.1007/s003400050509

Cite this article as:
Linnerud, I., Kaspersen, P. & Jaeger, T. Appl Phys B (1998) 67: 297. doi:10.1007/s003400050509

2

, CO, NH3, HCl and HF are described together with measurements from several installations. The monitors show continuous measurements with fast response and good sensitivity, all of which is difficult to obtain with conventional techniques such as wet chemical analysis.

PACS: 42.60.Fc; 42.62.Cf; 82.80.Ch

Copyright information

© Springer-Verlag 1998

Authors and Affiliations

  • I. Linnerud
    • 1
  • P. Kaspersen
    • 1
  • T. Jaeger
    • 1
  1. 1.Norsk Elektro Optikk A/S, Solheimv. 62 A, P.O. Box 384, N-1471 Skårer, Norway (Fax: +47 67 97 49 00, E-mail: ivar@neo.no; peter@neo.no; tycho@neo.no)NO