Applied Physics B

, Volume 104, Issue 1, pp 113–116

Adaptive synthesis of optical pattern for photonic crystal lithography

Authors

  • P. Q. Zhang
    • State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen University
    • Department of PhysicsHong Kong University of Science and Technology
  • X. S. Xie
    • State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen University
  • Y. F. Guan
    • State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen University
    • State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen University
    • Department of PhysicsHong Kong University of Science and Technology
  • L. Yan
    • Department of Computer Science and Electrical EngineeringUniversity of Maryland
Article

DOI: 10.1007/s00340-011-4423-5

Cite this article as:
Zhang, P.Q., Xie, X.S., Guan, Y.F. et al. Appl. Phys. B (2011) 104: 113. doi:10.1007/s00340-011-4423-5

Abstract

Intensity patterns for optical lithography are synthesized with phase-controlled multi-beam interference. By using a programmable spatial light modulator, reconfigurable intensity patterns can be generated and optimized to approach an objective intensity distribution. A self-adaptive annealing algorithm is applied to feedback control to obtain the predetermined intensity distribution. Typical photonic crystal with zigzag waveguides and micro-cavities are fabricated with a one-step-exposure lithographic technique.

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Copyright information

© Springer-Verlag 2011