Applied Physics B

, Volume 104, Issue 1, pp 113–116

Adaptive synthesis of optical pattern for photonic crystal lithography


DOI: 10.1007/s00340-011-4423-5

Cite this article as:
Zhang, P.Q., Xie, X.S., Guan, Y.F. et al. Appl. Phys. B (2011) 104: 113. doi:10.1007/s00340-011-4423-5


Intensity patterns for optical lithography are synthesized with phase-controlled multi-beam interference. By using a programmable spatial light modulator, reconfigurable intensity patterns can be generated and optimized to approach an objective intensity distribution. A self-adaptive annealing algorithm is applied to feedback control to obtain the predetermined intensity distribution. Typical photonic crystal with zigzag waveguides and micro-cavities are fabricated with a one-step-exposure lithographic technique.

Copyright information

© Springer-Verlag 2011

Authors and Affiliations

  1. 1.State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen UniversityGuangzhouChina
  2. 2.Department of PhysicsHong Kong University of Science and TechnologyKowloonChina
  3. 3.Department of Computer Science and Electrical EngineeringUniversity of MarylandBaltimoreUSA