Adaptive synthesis of optical pattern for photonic crystal lithography
- First Online:
- Cite this article as:
- Zhang, P.Q., Xie, X.S., Guan, Y.F. et al. Appl. Phys. B (2011) 104: 113. doi:10.1007/s00340-011-4423-5
Intensity patterns for optical lithography are synthesized with phase-controlled multi-beam interference. By using a programmable spatial light modulator, reconfigurable intensity patterns can be generated and optimized to approach an objective intensity distribution. A self-adaptive annealing algorithm is applied to feedback control to obtain the predetermined intensity distribution. Typical photonic crystal with zigzag waveguides and micro-cavities are fabricated with a one-step-exposure lithographic technique.