, Volume 103, Issue 3, pp 547-551
Date: 17 Sep 2010

Nanofabrication by magnetic focusing of supersonic beams

Rent the article at a discount

Rent now

* Final gross prices may vary according to local VAT.

Get Access


We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin magnetic film, into which apertures with widths on the order of 100 nm have been etched. Focused spot sizes near or below 10 nm, with focal lengths on the order of 10 μm, are predicted. Our method can be implemented in a highly parallel manner, enabling simultaneous fabrication of 106 identical elements, and it is applicable both to precision patterning of surfaces with metastable atomic beams and to direct deposition of material.