Applied Physics B

, Volume 99, Issue 4, pp 695–700

Antireflective properties of AZO subwavelength gratings patterned by holographic lithography

Article

DOI: 10.1007/s00340-010-4030-x

Cite this article as:
Leem, J.W., Song, Y.M., Lee, Y.T. et al. Appl. Phys. B (2010) 99: 695. doi:10.1007/s00340-010-4030-x

Abstract

We fabricate the aluminum-doped zinc oxide (AZO) subwavelength gratings (SWG) on Si and glass substrates by holographic lithography and sequent CH4/H2/Ar reactive ion etching process. The etch selectivity of AZO over photoresist mask as well as the nano-scale shape is optimized for better antireflection performance. To analyze the antireflective properties of AZO SWG surface, the optical reflectivity is measured and then calculated together with a rigorous coupled-wave analysis. The reflectance spectrum can be considerably changed by incorporating the SWG into AZO film. As the SWG height of AZO on Si substrate increases, the magnitude of interference oscillations in the reflectance spectrum tends to be reduced with the larger difference between its maxima. The use of optimized SWG can significantly reduce the surface reflection of AZO film at the desired wavelengths. The measured reflectance data of AZO SWG are reasonably consistent with the simulation results. No considerable change in transmission characteristics is observed for AZO SWG structures.

Copyright information

© Springer-Verlag 2010

Authors and Affiliations

  • J. W. Leem
    • 1
  • Y. M. Song
    • 2
  • Y. T. Lee
    • 2
  • J. S. Yu
    • 1
  1. 1.Department of Electronics and Radio EngineeringKyung Hee UniversityGiheung-gu, Yongin-si, Gyeonggi-doRepublic of Korea
  2. 2.Department of Information and CommunicationsGwangju Institute of Science and TechnologyBuk-gu, GwangjuRepublic of Korea