Applied Physics B

, Volume 94, Issue 2, pp 295–299

Enhanced refractive index well-confined planar and channel waveguides in KTiOPO4 produced by MeV C3+ ion implantation with low dose

Authors

  • L.-L. Wang
    • School of PhysicsShandong University
    • Department of PhysicsJining University
    • School of PhysicsShandong University
    • State Key Laboratory of Crystal MaterialsShandong University
  • Q.-M. Lu
    • School of Chemistry and Chemical EngineeringShandong University
  • H.-J. Ma
    • The State Key Laboratory of Nuclear Physics and TechnologyPeking University
Article

DOI: 10.1007/s00340-008-3340-8

Cite this article as:
Wang, L., Wang, K., Lu, Q. et al. Appl. Phys. B (2009) 94: 295. doi:10.1007/s00340-008-3340-8

Abstract

We report on the fabrication and characterization of planar and channel waveguides in KTiOPO4 crystals by 6.0 MeV C3+ ion implantation with the dose of 1×1014 ions/cm2. The dark mode spectroscopy of the planar waveguide was measured using a prism coupling arrangement. An increase of the both nx and ny refractive indices induced by the annealing after implantation is believed to be responsible for waveguide formation. The bright near-field intensity distribution of the transverse-electric and transverse-magnetic modes in the annealed channel waveguide was collected and studied by end-coupling method.

PACS

42.82Et61.80Jh

Copyright information

© Springer-Verlag 2008