Applied Physics B

, Volume 81, Issue 7, pp 871–874

Atomic fluorescence mapping of optical field intensity profiles issuing from nanostructured slits, milled into subwavelength metallic layers

  • G. Gay
  • B. Viaris de Lesegno
  • R. Mathevet
  • J. Weiner
  • H.J. Lezec
  • T.W. Ebbesen
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DOI: 10.1007/s00340-005-2016-x

Cite this article as:
Gay, G., Viaris de Lesegno, B., Mathevet, R. et al. Appl. Phys. B (2005) 81: 871. doi:10.1007/s00340-005-2016-x

Abstract

We report on a direct spatial profile measurement of optical field intensity issuing from subwavelength slits flanked by periodic grooves and fabricated on a thin metallic layer. This type of structure is of interest for the manipulation of cold atoms by optical potentials near surfaces.

Copyright information

© Springer-Verlag 2005

Authors and Affiliations

  • G. Gay
    • 1
  • B. Viaris de Lesegno
    • 1
    • 3
  • R. Mathevet
    • 1
  • J. Weiner
    • 1
  • H.J. Lezec
    • 2
    • 4
  • T.W. Ebbesen
    • 2
  1. 1.IRSAMC/LCARUniversité Paul SabatierToulouseFrance
  2. 2.ISISUniversité Louis PasteurStrasbourgFrance
  3. 3.Laboratoire Aimé CottonOrsayFrance
  4. 4.Thomas J. Watson Laboratories of Applied PhysicsCalifornia Institute of TechnologyPasadenaUSA

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