Article

Applied Physics B

, Volume 79, Issue 3, pp 279-283

First online:

Atom lithography with two-dimensional optical masks

  • S.J.H. PetraAffiliated withAtomic and Laser Physics Group, Laser Centre Vrije Universiteit
  • , K.A.H. van LeeuwenAffiliated withAtomic and Laser Physics Group, Laser Centre Vrije Universiteit
  • , L. FeenstraAffiliated withAtomic and Laser Physics Group, Laser Centre Vrije Universiteit
  • , W. HogervorstAffiliated withAtomic and Laser Physics Group, Laser Centre Vrije Universiteit
  • , W. VassenAffiliated withAtomic and Laser Physics Group, Laser Centre Vrije Universiteit Email author 

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Abstract

With a two-dimensional (2D) optical mask at λ=1083 nm, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrophobic resist layer, which is removed in a wet etching process. Experiments have been performed with several polarizations for the optical mask, resulting in different intensity patterns, and corresponding nanoscale structures. The results for a linear polarized light field show an array of holes with a diameter of 260 nm, in agreement with a computed pattern. With a circularly polarized light field a line pattern is observed with a spacing of λ/20.5=766 nm. Simulations taking into account many possible experimental imperfections can not explain this pattern.