, Volume 77, Issue 1, pp 1-9
Date: 08 Aug 2003

Atomic nanofabrication with complex light fields

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Abstract

The method of neutral atom lithography allows one to transfer to a substrate a 2D intensity modulation of an atomic beam imposed by an inhomogeneous light field. The complexity of the pattern depends on the properties of the light field constructed from the superposition of multiple laser beams. For the design of suitable light fields we present a mathematical model with a corresponding numerical simulation of the so-called inverse problem. Furthermore, details of an experiment carried out with a holographically reconstructed light field are discussed.

PACS

02.60.Pn; 42.40.My; 42.40.Pa; 42.50.Vk