Applied Physics B

, Volume 74, Supplement 1, pp s189–s192

Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation

  • P. Simon
  • J. Bekesi
  • C. Dölle
  • J.-H. Klein-Wiele
  • G. Marowsky
  • S. Szatmari
  • B. Wellegehausen
Article

DOI: 10.1007/s00340-002-0875-y

Cite this article as:
Simon, P., Bekesi, J., Dölle, C. et al. Appl Phys B (2002) 74(Suppl 1): s189. doi:10.1007/s00340-002-0875-y

Abstract.

A new scheme to increase the extractable energy from a table-top KrF amplifier up to 100 mJ/pulse is presented. Applications of such pulses for micro-machining and for the generation of powerful XUV radiation are demonstrated.

PACS: 42.60.Da; 42.65.Ky; 81.40.-z 

Copyright information

© Springer-Verlag 2002

Authors and Affiliations

  • P. Simon
    • 1
  • J. Bekesi
    • 1
  • C. Dölle
    • 1
  • J.-H. Klein-Wiele
    • 1
  • G. Marowsky
    • 1
  • S. Szatmari
    • 2
  • B. Wellegehausen
    • 3
  1. 1.Laser-Laboratorium Göttingen, Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, GermanyDE
  2. 2.Department of Experimental Physics, University of Szeged, Dom tér 9, 6720 Szeged, HungaryHU
  3. 3.Institute of Quantum Optics, University of Hannover, Welfengarten 1, 30167 Hannover, GermanyDE

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