, Volume 74, Issue 1 Supplement, pp s189-s192

Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation

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Abstract.

A new scheme to increase the extractable energy from a table-top KrF amplifier up to 100 mJ/pulse is presented. Applications of such pulses for micro-machining and for the generation of powerful XUV radiation are demonstrated.

Received: 14 September 2001 / Revised version: 8 November 2001 / Published online: 20 June 2002