Applied Physics A

, Volume 74, Issue 4, pp 453–456

Excimer laser-induced etching of sub-micron surface relief gratings in fused silica using phase grating projection

Authors

  • K. Zimmer
    • Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig, Germany
  • R. Böhme
    • Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig, Germany
  • A. Braun
    • Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig, Germany
  • B. Rauschenbach
    • Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig, Germany
  • F. Bigl
    • Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig, Germany

DOI: 10.1007/s003390101184

Cite this article as:
Zimmer, K., Böhme, R., Braun, A. et al. Appl Phys A (2002) 74: 453. doi:10.1007/s003390101184

Abstract.

Phase grating projection using a Schwarzschild objective is presented in conjunction with a process that allows laser-induced etching of transparent materials at the interface of liquids, in order to generate periodical surface relief structures with sub-micron resolution in fused silica. The achieved sinusoidal gratings exhibit a period of 780 nm and a depth of up to 180 nm, having a roughness lower than 5 nm r.m.s. The depth and roughness of the gratings are related to the applied laser fluence and pulse number. In addition to the grating formation, an overall removal of material at higher laser fluences was found.

PACS: 42.55.Lt; 42.70.Ce; 42.79.Dj
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© Springer-Verlag 2002