Applied Physics A

, Volume 73, Issue 5, pp 561–566

Femtosecond two-photon stereo-lithography

  • M. Miwa
  • S. Juodkazis
  • T. Kawakami
  • S. Matsuo
  • H. Misawa

DOI: 10.1007/s003390100934

Cite this article as:
Miwa, M., Juodkazis, S., Kawakami, T. et al. Appl Phys A (2001) 73: 561. doi:10.1007/s003390100934

Abstract.

We report herein a method for the three-dimensional (3D) fabrication of microstructures by means of direct fs-beam writing (scanning) inside a polymerizable resin. Photopolymerization takes place via two-photon absorption (TPA), as indicated by measurements of transmission power dependence. This concept of fabrication is based on two principles: the use of short, sub-picosecond pulses and simultaneous tight focusing (numerical aperture, NA>1). This approach creates a unique opportunity for avoiding self-focusing even at very high intensities, as the power is lower than the self-focusing threshold. Under such conditions, no filament formation takes place and no thermal convection disturbance occurs in the focal vicinity during photo-polymerization. This technique requires no sacrificial layers or structures in real 3D micro-stereo-lithography.

PACS: 81.05.Lg; 82.35.-x; 61.41.+e 

Copyright information

© Springer-Verlag 2001

Authors and Affiliations

  • M. Miwa
    • 1
  • S. Juodkazis
    • 1
  • T. Kawakami
    • 1
  • S. Matsuo
    • 1
  • H. Misawa
    • 1
  1. 1.Faculty of Engineering, The University of Tokushima, 2-1 Minamijosanjima, Tokushima 770-8506, JapanJP

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