Ablated gratings on borosilicate glass by 193-nm excimer laser radiation
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- Pissadakis, S., Reekie, L., Hempstead, M. et al. Appl Phys A (1999) 69(Suppl 1): S739. doi:10.1007/s003390051519
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Relief gratings of 500-nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation through the use of an excimer laser, at a wavelength of 193-nm, and a modified Mach–Zehnder interferometer. The grating fabrication process has been quantified by the use of diffraction efficiency measurements and atomic force microscope microscans and is related to the incident energy density.