Applied Physics A

, Volume 69, Supplement 1, pp S739–S741

Ablated gratings on borosilicate glass by 193-nm excimer laser radiation

  • S. Pissadakis
  • L. Reekie
  • M. Hempstead
  • M.N. Zervas
  • J.S. Wilkinson

DOI: 10.1007/s003390051519

Cite this article as:
Pissadakis, S., Reekie, L., Hempstead, M. et al. Appl Phys A (1999) 69(Suppl 1): S739. doi:10.1007/s003390051519

Abstract.

Relief gratings of 500-nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation through the use of an excimer laser, at a wavelength of 193-nm, and a modified Mach–Zehnder interferometer. The grating fabrication process has been quantified by the use of diffraction efficiency measurements and atomic force microscope microscans and is related to the incident energy density.

PACS: 79.20D; 42.40E; 85.40U 

Copyright information

© Springer-Verlag 1999

Authors and Affiliations

  • S. Pissadakis
    • 1
  • L. Reekie
    • 1
  • M. Hempstead
    • 1
  • M.N. Zervas
    • 1
  • J.S. Wilkinson
    • 1
  1. 1.Optoelectronics Research Centre, University of Southampton, Highfield, Southampton, SO17 1BJ, UKUK

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