, Volume 69, Issue 1 Supplement, pp S739-S741

Ablated gratings on borosilicate glass by 193-nm excimer laser radiation

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Abstract.

Relief gratings of 500-nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation through the use of an excimer laser, at a wavelength of 193-nm, and a modified Mach–Zehnder interferometer. The grating fabrication process has been quantified by the use of diffraction efficiency measurements and atomic force microscope microscans and is related to the incident energy density.
Received: 21 July 1999 / Accepted: 11 September 1999 / Published online: 28 December 1999