Applied Physics A

, Volume 66, Supplement 1, pp S427–S430

Force microscopy imaging of photopatterned organosilane monolayers: application to probe alignment in AFM patterning following photolithography

  • H. Sugimura
  • N. Nakagiri
Regular paper

DOI: 10.1007/s003390051176

Cite this article as:
Sugimura, H. & Nakagiri, N. Appl Phys A (1998) 66(Suppl 1): S427. doi:10.1007/s003390051176
  • 126 Downloads

PACS: 82.65.-i; 82.80.-d; 68.60.-p 

Copyright information

© Springer-Verlag 1998

Authors and Affiliations

  • H. Sugimura
    • 1
  • N. Nakagiri
    • 1
  1. 1.Tsukuba Research Laboratory, Nikon Co., 5-9-1 Tokodai, Tsukuba 300-26, JapanJP

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