Applied Physics A

, Volume 66, Issue 5, pp 579–582

Microdeposition of metal and oxide structures using ultrashort laser pulses

Authors

  • I. Zergioti
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
  • S. Mailis
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
  • N.A. Vainos
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
  • P. Papakonstantinou
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
  • C. Kalpouzos
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
  • C.P. Grigoropoulos
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
  • C. Fotakis
    • Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr)
Rapid communication

DOI: 10.1007/s003390050717

Cite this article as:
Zergioti, I., Mailis, S., Vainos, N. et al. Appl Phys A (1998) 66: 579. doi:10.1007/s003390050717

2

O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.

PACS: 81.15.F; 07.10.C; 42.40.J

Copyright information

© Springer-Verlag 1998