Applied Physics A

, Volume 102, Issue 3, pp 551–557

Uniform plasmonic near-field nanopatterning by backward irradiation of femtosecond laser

  • Go Obara
  • Yuto Tanaka
  • Tomoya Miyanishi
  • Minoru Obara
Article

DOI: 10.1007/s00339-010-6075-4

Cite this article as:
Obara, G., Tanaka, Y., Miyanishi, T. et al. Appl. Phys. A (2011) 102: 551. doi:10.1007/s00339-010-6075-4

Abstract

We present localized optical field distribution properties in the vicinity of gold particles on a silicon substrate by backward and forward irradiation. It is technically difficult to fabricate nanostructures on the surface by a conventional forward laser incident to the substrate because gold nanoparticles easily aggregate to form double-layered particle arrays. We calculated enhanced optical field properties in order to pattern the substrate surface only with a template of the bottom-layered particle arrays in the case that the backward irradiation of a femtosecond laser is used in the system of aggregated double-layered gold nanoparticle arrays. With the backward irradiation, the optical field intensity in the substrate for the double-layered hexagonal arrays is found to be only 30% lower than the mono-layered system. Moreover, a near field cannot be generated with the forward irradiation. As a result, only the backward irradiation scheme is found to be effective for uniform surface nanopatterning at enhanced plasmonic near-field zones.

Copyright information

© Springer-Verlag 2010

Authors and Affiliations

  • Go Obara
    • 1
  • Yuto Tanaka
    • 1
  • Tomoya Miyanishi
    • 1
  • Minoru Obara
    • 1
  1. 1.School of Integrated Design EngineeringKeio UniversityYokohamaJapan