Applied Physics A

, Volume 101, Issue 2, pp 309–312

Nanostructuring of thin films by ns pulsed laser interference


DOI: 10.1007/s00339-010-5822-x

Cite this article as:
Riedel, S., Schmotz, M., Leiderer, P. et al. Appl. Phys. A (2010) 101: 309. doi:10.1007/s00339-010-5822-x


We show that nanosecond pulsed laser interference can be used to structure surfaces on a nanoscale. With this method, we are able to create hollow structures on various thin films like Ta, Ni, Au, Cu, Co, and NiTi. We find that the structuring mechanism is related to the mechanical effect of thermal expansion upon melting. To corroborate this model, we study materials with an abnormal behavior at the melting point like Si, Ge, or Bi, as they contract upon melting.

Copyright information

© Springer-Verlag 2010

Authors and Affiliations

  • S. Riedel
    • 1
  • M. Schmotz
    • 1
  • P. Leiderer
    • 1
  • J. Boneberg
    • 1
  1. 1.University of KonstanzKonstanzGermany