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Spallative ablation of dielectrics by X-ray laser

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Abstract

A short laser pulse in wide range of wavelengths, from infrared to X-ray, disturbs electron–ion equilibrium and increases pressure in a heated layer. The case where the pulse duration τ L is shorter than acoustic relaxation time t s is considered in the paper. It is shown that this short pulse may cause thermomechanical phenomena such as spallative ablation regardless of wavelength. While the physics of electron–ion relaxation strongly depends on wavelength and various electron spectra of substances: there are spectra with an energy gap in semiconductors and dielectrics opposed to gapless continuous spectra in metals. The paper describes entire sequence of thermomechanical processes from expansion, nucleation, foaming, and nanostructuring to spallation with particular attention to spallation by X-ray pulse.

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Authors and Affiliations

  1. L.D. Landau Institute for Theoretical Physics, Russian Academy of Sciences, Chernogolovka, 142432, Russia

    N. A. Inogamov, V. A. Khokhlov, Y. V. Petrov & S. I. Anisimov

  2. Department of Physics, University of South Florida, Tampa, FL, 33620-5700, USA

    V. V. Zhakhovsky

  3. Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow, 125412, Russia

    V. V. Zhakhovsky, A. Y. Faenov, I. Y. Skobelev, T. A. Pikuz & V. E. Fortov

  4. Kansai Photon Science Institute, Japan Atomic Energy Agency, Kyoto, 619-0215, Japan

    A. Y. Faenov, Y. Kato, M. Tanaka, T. A. Pikuz, M. Kishimoto, M. Ishino, M. Nishikino, Y. Fukuda, S. V. Bulanov & T. Kawachi

  5. Institute for Computer Aided Design, Russian Academy of Sciences, Moscow, 123056, Russia

    V. V. Shepelev

  6. The Graduate School for the Creation of New Photonics Industries, Hamamatsu, Shizuoka, 431-1202, Japan

    Y. Kato

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  1. N. A. Inogamov
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Correspondence to N. A. Inogamov.

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Inogamov, N.A., Zhakhovsky, V.V., Faenov, A.Y. et al. Spallative ablation of dielectrics by X-ray laser. Appl. Phys. A 101, 87–96 (2010). https://doi.org/10.1007/s00339-010-5764-3

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  • DOI: https://doi.org/10.1007/s00339-010-5764-3

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