Applied Physics A

, Volume 95, Issue 4, pp 1059–1066

Fabrication and characterization of hollow metal waveguides for optical interconnect applications

  • Robert Bicknell
  • Laura King
  • Charles E. Otis
  • Jong-Souk Yeo
  • Neal Meyer
  • Pavel Kornilovitch
  • Scott Lerner
  • Lenward Seals
Article

DOI: 10.1007/s00339-009-5206-2

Cite this article as:
Bicknell, R., King, L., Otis, C.E. et al. Appl. Phys. A (2009) 95: 1059. doi:10.1007/s00339-009-5206-2

Abstract

As data rates continue to increase in high-performance computer systems and networks, it is becoming more difficult for copper-based interconnects to keep pace. An alternative approach to meet these requirements is to move to optical-based interconnect technologies which offer a number of advantages over the legacy copper-based solutions. In order to meet the stringent requirements of high performance and low cost, manufacturable waveguide technologies must be developed. Past solutions have often employed polymer waveguide technologies, which can be expensive and limited by modal dispersion. In the present work, hollow metal waveguides (HMWGs) are investigated as a potential alternative. These waveguides demonstrate very low optical losses of <0.05 dB/cm and the capability to transmit at extremely high data rates. The fabrication, modeling, characterization of the HMWGs are discussed to enable photonic interconnect solutions for future generations of computer and server products.

PACS

42.82.-m 42.79.Gn 42.79.Fm 42.79.Sz 42.82.Ds 

Copyright information

© Springer-Verlag 2009

Authors and Affiliations

  • Robert Bicknell
    • 1
  • Laura King
    • 1
  • Charles E. Otis
    • 1
  • Jong-Souk Yeo
    • 1
  • Neal Meyer
    • 1
  • Pavel Kornilovitch
    • 1
  • Scott Lerner
    • 1
  • Lenward Seals
    • 1
  1. 1.Hewlett-Packard CompanyCorvallisUSA

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