Applied Physics A

, Volume 89, Issue 1, pp 209–212

Characterization of the bonding structure of nanocrystalline diamond and amorphous carbon films prepared by plasma assisted techniques

Authors

    • Institute of Nanostructure Technologies and Analytics (INA)University of Kassel
  • W. Kulisch
    • Institute of Nanostructure Technologies and Analytics (INA)University of Kassel
    • JRCInstitute for Health and Consumer Protection
  • S. Bliznakov
    • Institute of Nanostructure Technologies and Analytics (INA)University of Kassel
  • B. Mednikarov
    • Central Laboratory of PhotoprocessesBulgarian Academy of Sciences
  • G. Spasov
    • Central Laboratory of PhotoprocessesBulgarian Academy of Sciences
  • J. Pirov
    • Central Laboratory of PhotoprocessesBulgarian Academy of Sciences
  • M. Jelinek
    • Institute of PhysicsAcademy of Sciences of the Czech Republic
  • T. Kocourek
    • Institute of PhysicsAcademy of Sciences of the Czech Republic
  • J. Zemek
    • Institute of PhysicsAcademy of Sciences of the Czech Republic
Article

DOI: 10.1007/s00339-007-4092-8

Cite this article as:
Popov, C., Kulisch, W., Bliznakov, S. et al. Appl. Phys. A (2007) 89: 209. doi:10.1007/s00339-007-4092-8

Abstract

Thin nanocrystalline diamond/amorphous carbon (NCD/a-C) composite films and amorphous diamond-like carbon (DLC) films were prepared by three methods: microwave plasma chemical vapour deposition (MWCVD) from methane/nitrogen mixtures (NCD/a-C), RF magnetron sputtering of a pure graphite target in argon/methane ambients, and pulsed laser deposition (PLD) in vacuum or argon atmosphere (DLC). The films prepared by the three techniques were comprehensively characterized with respect to their bonding structure by Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS).

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© Springer-Verlag 2007