, Volume 89, Issue 1, pp 209-212
Date: 15 Jun 2007

Characterization of the bonding structure of nanocrystalline diamond and amorphous carbon films prepared by plasma assisted techniques

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Thin nanocrystalline diamond/amorphous carbon (NCD/a-C) composite films and amorphous diamond-like carbon (DLC) films were prepared by three methods: microwave plasma chemical vapour deposition (MWCVD) from methane/nitrogen mixtures (NCD/a-C), RF magnetron sputtering of a pure graphite target in argon/methane ambients, and pulsed laser deposition (PLD) in vacuum or argon atmosphere (DLC). The films prepared by the three techniques were comprehensively characterized with respect to their bonding structure by Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS).