, Volume 88, Issue 4, pp 633-637

Characterization and electrical properties of high-k GdScO3 thin films grown by atomic layer deposition

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Abstract

Gadolinium scandium oxide (Gd-scandate, GdScO3) thin films were grown by atomic layer deposition (ALD) from β-diketonate precursors M(thd)3 (M=Gd, Sc; thd=2,2,6,6-tetramethyl-3,5-heptanedionato) and ozone. The deposition parameters were optimized to produce films with the stoichiometric 1:1 metal ratio and a series of samples with nominal thicknesses of 5, 10, 15, and 20 nm were prepared. At 300 °C the metal precursor pulsing ratio Gd:Sc=5:6 yielded amorphous stoichiometric films and a growth rate of 0.21 Å/cycle. The films stayed amorphous up to 900 °C. The surface was probed with an AFM and the rms roughness was found to be 0.3 nm for the 5–20 nm thick films. The electrical properties of the as-deposited films proved to be very promising, with a dielectric constant of ∼22 and leakage current density of 340 μA/cm2, measured at -2 V.

PACS

77.55.+f; 77.22.Ch; 73.61.Ng; 73.40.Rw; 78.40.Ha