Applied Physics A

, Volume 88, Issue 4, pp 719–725

Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Authors

    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • F. Delmotte
    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • F. Bridou
    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • M.F. Ravet
    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • F. Varniere
    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • M. Roulliay
    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • A. Jerome
    • Laboratoire Charles Fabry de l’Institut d’Optique, CNRSUniv. Paris Sud
  • I. Vickridge
    • Institut des NanoSciences de Paris
Article

DOI: 10.1007/s00339-007-4041-6

Cite this article as:
Gautier, J., Delmotte, F., Bridou, F. et al. Appl. Phys. A (2007) 88: 719. doi:10.1007/s00339-007-4041-6

Abstract

Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.

Copyright information

© Springer-Verlag 2007