Applied Physics A

, Volume 82, Issue 1, pp 23–26

Maskless nonlinear lithography with femtosecond laser pulses

  • J. Koch
  • E. Fadeeva
  • M. Engelbrecht
  • C. Ruffert
  • H.H. Gatzen
  • A. Ostendorf
  • B.N. Chichkov
Rapid communication

DOI: 10.1007/s00339-005-3418-7

Cite this article as:
Koch, J., Fadeeva, E., Engelbrecht, M. et al. Appl. Phys. A (2006) 82: 23. doi:10.1007/s00339-005-3418-7

Abstract

Development of maskless lithography techniques can provide a potential solution for the photomask cost issue. Furthermore, it could open a market for small-scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution – whereas the limit of achievable structure sizes is predicted to be below 100 nm – it is attractive to use this technique for maskless lithography. In this paper, we present the first results on super-resolution femtosecond laser lithography, which show great potential for future applications.

Copyright information

© Springer-Verlag 2005

Authors and Affiliations

  • J. Koch
    • 1
  • E. Fadeeva
    • 1
  • M. Engelbrecht
    • 1
  • C. Ruffert
    • 2
  • H.H. Gatzen
    • 2
  • A. Ostendorf
    • 1
  • B.N. Chichkov
    • 1
  1. 1.Laser Zentrum Hannover e.V.HannoverGermany
  2. 2.Institute for MicrotechnologyHanover UniversityGarbsenGermany