Applied Physics A

, Volume 79, Issue 4, pp 1395–1397

Metal/metal-oxide/metal etalon structures grown by pulsed laser deposition

Authors

    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
  • A. Tsigara
    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
    • Chemical Engineering DepartmentNational Technical University of Athens
  • J. Manasis
    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
    • Chemical Engineering DepartmentNational Technical University of Athens
  • A. Giannoudakos
    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
    • Chemical Engineering DepartmentNational Technical University of Athens
  • G. Mousdis
    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
  • N. Vakakis
    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
    • Chemical Engineering DepartmentNational Technical University of Athens
  • M. Kompitsas
    • NHRF – The National Hellenic Research FoundationTheoretical and Physical Chemistry Institute-TPCI
  • A. Klini
    • Institute of Electronic Structure & Laser (IESL)Foundation for Research and Technology Hellas (FORTH)
  • F. Roubani-Kalantzopoulou
    • Chemical Engineering DepartmentNational Technical University of Athens
Article

DOI: 10.1007/s00339-004-2791-y

Cite this article as:
Vainos, N., Tsigara, A., Manasis, J. et al. Appl. Phys. A (2004) 79: 1395. doi:10.1007/s00339-004-2791-y

Abstract

Multilayered metal/metal-oxide/metal structures are fabricated by pulsed laser deposition in alternating non-reactive and reactive oxidising conditions, by using pure metal targets. The variety of metals used includes tantalum, zinc and indium. Further to the well-known interferometric, etalon, optical behaviour the structures feature additional activation properties owing to the nanoscopic nature of the oxide materials incorporated.

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Copyright information

© Springer-Verlag 2004